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One thought on “Extending Moore’s Law”
There are all sorts of proposals to extend Moore’s law. EUV has been taking forever to come out. Not that it is surprising. This is a rehash of what happened last time people tried using soft x-rays to do lithography.
What will probably happen in the short term is they will use conventional lithography for the low resolution features on a chip and e-beam lithography for small critical high resolution features. They already are using e-beam to generate masks. Currently those masks are very expensive to make because of the low throughput of current e-beam technology. Nothing says the throughput cannot be improved however. A lot of people are working on e-beam systems with multiple beams.
There are all sorts of proposals to extend Moore’s law. EUV has been taking forever to come out. Not that it is surprising. This is a rehash of what happened last time people tried using soft x-rays to do lithography.
What will probably happen in the short term is they will use conventional lithography for the low resolution features on a chip and e-beam lithography for small critical high resolution features. They already are using e-beam to generate masks. Currently those masks are very expensive to make because of the low throughput of current e-beam technology. Nothing says the throughput cannot be improved however. A lot of people are working on e-beam systems with multiple beams.